Manipulating InAs nanowires with submicrometer precision.
Identifieur interne : 001286 ( Main/Exploration ); précédent : 001285; suivant : 001287Manipulating InAs nanowires with submicrometer precision.
Auteurs : RBID : pubmed:22128982Abstract
InAs nanowires are grown epitaxially by catalyst-free metal organic vapor phase epitaxy and are subsequently positioned with a lateral accuracy of less than 1 μm using simple adhesion forces between the nanowires and an indium tip. The technique, requiring only an optical microscope, is used to place individual nanowires onto the corner of a cleaved-edge wafer as well as across predefined holes in Si(3)N(4) membranes. The precision of the method is limited by the stability of the micromanipulators and the precision of the optical microscope.
DOI: 10.1063/1.3657135
PubMed: 22128982
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Le document en format XML
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<author><name sortKey="Fl Hr, Kilian" uniqKey="Fl Hr K">Kilian Flöhr</name>
<affiliation wicri:level="3"><nlm:affiliation>II. Institute of Physics B and JARA-FIT, RWTH Aachen, 52074 Aachen, Germany. floehr@physik.rwth-aachen.de</nlm:affiliation>
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<author><name sortKey="Liebmann, Marcus" uniqKey="Liebmann M">Marcus Liebmann</name>
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<author><name sortKey="Sladek, Kamil" uniqKey="Sladek K">Kamil Sladek</name>
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<author><name sortKey="G Nel, H Yusuf" uniqKey="G Nel H">H Yusuf Günel</name>
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<author><name sortKey="Frielinghaus, Robert" uniqKey="Frielinghaus R">Robert Frielinghaus</name>
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<author><name sortKey="Haas, Fabian" uniqKey="Haas F">Fabian Haas</name>
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<author><name sortKey="Meyer, Carola" uniqKey="Meyer C">Carola Meyer</name>
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<author><name sortKey="Hardtdegen, Hilde" uniqKey="Hardtdegen H">Hilde Hardtdegen</name>
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<author><name sortKey="Sch Pers, Thomas" uniqKey="Sch Pers T">Thomas Schäpers</name>
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<author><name sortKey="Gr Tzmacher, Detlev" uniqKey="Gr Tzmacher D">Detlev Grützmacher</name>
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<author><name sortKey="Morgenstern, Markus" uniqKey="Morgenstern M">Markus Morgenstern</name>
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<front><div type="abstract" xml:lang="en">InAs nanowires are grown epitaxially by catalyst-free metal organic vapor phase epitaxy and are subsequently positioned with a lateral accuracy of less than 1 μm using simple adhesion forces between the nanowires and an indium tip. The technique, requiring only an optical microscope, is used to place individual nanowires onto the corner of a cleaved-edge wafer as well as across predefined holes in Si(3)N(4) membranes. The precision of the method is limited by the stability of the micromanipulators and the precision of the optical microscope.</div>
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<Abstract><AbstractText>InAs nanowires are grown epitaxially by catalyst-free metal organic vapor phase epitaxy and are subsequently positioned with a lateral accuracy of less than 1 μm using simple adhesion forces between the nanowires and an indium tip. The technique, requiring only an optical microscope, is used to place individual nanowires onto the corner of a cleaved-edge wafer as well as across predefined holes in Si(3)N(4) membranes. The precision of the method is limited by the stability of the micromanipulators and the precision of the optical microscope.</AbstractText>
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